on front Sheet resistance measurement |
|
| Current |
1e-06 .. 0.2 A |
|---|
| Materials |
silicon (doped), metal (category) |
|---|
| Sheet resistance |
0.005 .. 1e+06 Ω/square |
|---|
| Sides processed |
either |
|---|
| Voltage |
1e-06 .. 1 V |
|---|
| Wafer size |
|
|---|
| Equipment |
CDE ResMap 168 Resistivity measurement |
| Equipment characteristics: |
| Batch sizes |
150 mm: 25 |
|---|
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, notched, no-flat |
|---|
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon on insulator, silicon |
|---|
| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 675 µm |
|---|
