| KOH Silicon etch |
| Photoresist strip (O2 plasma) |
| Photoresist wet strip |
| Polysilicon RIE |
| Silicon dioxide RIE |
| Silicon nitride RIE |
| silicon DRIE (Bosch Process) |
| Buffered Oxide Etch |
| Chromium wet etch |
| EDP silicon etch |
| Gold wet etch |
| KOH silicon etch |
| Photoresist Strip |
| Photoresist ashing I (metal allowed) |
| Photoresist ashing II (metal allowed) |
| Silicon DRIE |
| Aluminum wet etch |
| HF etch (10:1) |
| Silicon RIE (smooth sidewalls) |
| Silicon deep RIE |
